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Nikon has this week introduced the event of its new NSR-S636E ArF Immersion Scanner to offer industry-leading lithography options and allow prospects to advance “semiconductor manufacturing and assist drive the digital transformation” explains the press.
The following technology of NSR-S636E ArF immersion scanner at the moment are below growth and can ship superior overlay accuracy and ultra-high throughput to help manufacturing of essentially the most vital semiconductor units, with gross sales anticipated to start someday throughout 2023. Iconic planes somewhat extra concerning the NSR-S636E ArF immersion scanner.
Nikon NSR-S636E ArF immersion scanner
“Because the digital transformation (DX) accelerates, there may be an important have to course of and talk large volumes of information in a short time. Excessive-performance semiconductors are crucial to fulfill these necessities, and semiconductor gadget expertise is progressing with a simultaneous concentrate on circuit sample miniaturization in addition to three-d (3D) gadget construction growth.”
“The NSR-S636E options an enhanced inline Alignment Station, or iAS, which is a wafer pre-measurement module built-in between the coater/developer unit and the lithography scanner. The S636E and iAS make the most of subtle multi-point alignment measurement and excessive order correction features that allow gadget makers to realize the stringent overlay accuracy vital for 3D gadget constructions, whereas additionally maximizing immersion scanner productiveness. The NSR-S636E is well-suited for cutting-edge semiconductor manufacturing together with logic and reminiscence units, CMOS picture sensor purposes and extra.”
Supply : Nikon
Filed Underneath: Know-how Information
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